Phosphorus implant for S/D extension formation: Diffusion and activation study after spacer and spike anneal

• Main Authors: Yeong, S.H., Colombeau, B., Benistant, F., Srinivasan, M.P., Mulcahy, C.P.A., Lee, P.S., Chan, L.
• 其他作者: CHEMICAL & BIOMOLECULAR ENGINEERING
• 格式: Conference or Workshop Item
• 出版: 2014
• 主題: Ge-pai; Halo implant; Phosphorus; Spacer anneal; SPER; Spike anneal
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/74713

AIP Conference Proceedings