MeV-ion beam analysis of the interface between filtered cathodic arc-deposited a-carbon and single crystalline silicon

MeV-ion beam analysis of the interface between filtered cathodic arc-deposited a-carbon and single crystalline silicon

Amorphous carbon (a-C) films were deposited on Si(1 0 0) wafers by a filtered cathodic vacuum arc (FCVA) plasma source. A negative electrical bias was applied to the silicon substrate in order to control the incident energy of carbon ions. Effects of the electrical bias on the a-C/Si interface chara...

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書目詳細資料
Main Authors:	T. Kamwanna, N. Pasaja, L. D. Yu, T. Vilaithong, A. Anders, S. Singkarat
格式:	雜誌
出版:	2018
主題:	Physics and Astronomy
在線閱讀:	https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=56949104178&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/60722
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!
機構:	Chiang Mai University

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