Characterization of thin-film GaAs diodes grown on germanium-on-insulator on Si substrate
In this study, we report the characterization of thin-film GaAsgrown on germanium-on-insulator (GeOI) on Si substrate. A GaAs/GeOI diode with a 600 nm buffer layer showed a rectification of 1.0 × 107 at ±2 V and had an electrical performance similar to that of the reference sample grown on GaAs subs...
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Main Authors: | , , , , , |
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格式: | Article |
語言: | English |
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2014
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在線閱讀: | https://hdl.handle.net/10356/79482 http://hdl.handle.net/10220/18862 |
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機構: | Nanyang Technological University |
語言: | English |