Characterization of flourosilicate glass (FSG) as low dielectric constant material

• المؤلف الرئيسي: Teh, Young Way.
• مؤلفون آخرون: Wong, Terence Kin Shun
• التنسيق: Theses and Dissertations
• منشور في: 2008
• الموضوعات: DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
• الوصول للمادة أونلاين: http://hdl.handle.net/10356/3542
• المؤسسة: Nanyang Technological University

The characterization of flourine doped oxide (FSG) film as a low-k- dielectric material involved three main parts. In the first part of the project, the effect flourine incorporation and increasing flourine content on the film structure and dielectric constant were studied. The incorporation of Si-...