Circular apertures for contact hole patterning in 193 nm immersion lithography

Circular apertures for contact hole patterning in 193 nm immersion lithography

10.1116/1.3546100

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書目詳細資料
Main Authors:	Tay, C.J., Quan, C., Ling, M.L., Chua, G.S., Tan, S.K., Lin, Q.
其他作者:	MECHANICAL ENGINEERING
格式:	Article
出版:	2014
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/59709
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!
機構:	National University of Singapore

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