Impact of deposition parameters on the material quality of SPC poly-Si thin films using high-rate PECVD of a-Si:H

10.1051/epjpv/2015004

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書目詳細資料
Main Authors:	Kumar, A, Widenborg, P.I, Dalapati, G.K, Subramanian, G.S, Aberle, A.G
其他作者:	ELECTRICAL AND COMPUTER ENGINEERING
格式:	Article
出版:	2020
主題:	Deposition rates Flow of gases Metallic films Polycrystalline materials Polysilicon Silicon wafers Substrates Crystal qualities Deposition Parameters Glass substrates High deposition rates Material quality Poly-Si thin film Single-crystalline UV-VIS-NIR spectrophotometers Thin films
在線閱讀:	https://scholarbank.nus.edu.sg/handle/10635/176153
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!
機構:	National University of Singapore

實物特徵
總結:	10.1051/epjpv/2015004

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