Textured Ni(Pt) germanosilicide formation on a condensed Si1-xGex/Si substrate

A study of Ni and Ni(Pt) germanosilicidation on a condensed Si1−xGex/Si substrate was performed. The partial relaxation of the condensed SiGe layer resulted in an improvement in the morphological stability of the germanosilicide through the alleviation of compressive stress. Pt alloying to th...

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Main Authors: Setiawan, Y., Balakumar, S., Tan, Eu Jin, Pey, Kin Leong, Lee, Pooi See
其他作者: School of Materials Science & Engineering
格式: Article
語言:English
出版: 2012
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在線閱讀:https://hdl.handle.net/10356/95013
http://hdl.handle.net/10220/8004
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