Textured Ni(Pt) germanosilicide formation on a condensed Si1-xGex/Si substrate

• المؤلفون الرئيسيون: Setiawan, Y., Balakumar, S., Tan, Eu Jin, Pey, Kin Leong, Lee, Pooi See
• مؤلفون آخرون: School of Materials Science & Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2012
• الموضوعات: DRNTU::Engineering::Materials
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/95013; http://hdl.handle.net/10220/8004
• المؤسسة: Nanyang Technological University

A study of Ni and Ni(Pt) germanosilicidation on a condensed Si1−xGex/Si substrate was performed. The partial relaxation of the condensed SiGe layer resulted in an improvement in the morphological stability of the germanosilicide through the alleviation of compressive stress. Pt alloying to th...