Pulsed laser induced silicidation on TiN-capped Co/Si bilayers

This paper studies the effects of pulsed laser-induced annealing of TiN-capped Co/Si bilayers with and without preamorphized Si substrate. For a low fluence of 0.2 J /cm2, nonstoichiometry Co silicide with triple-layered structure is formed. On the other hand, highly textured CoSi2 gra...

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Main Authors: Chow, F. L., Lee, Pooi See, Pey, Kin Leong, Tang, L. J., Tung, Chih Hang, Wang, X. C., Lim, G. C.
其他作者: School of Materials Science & Engineering
格式: Article
語言:English
出版: 2012
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在線閱讀:https://hdl.handle.net/10356/95012
http://hdl.handle.net/10220/8022
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