Nickel silicide formation using multiple-pulsed laser annealing

• المؤلفون الرئيسيون: Setiawan, Y., Chow, F. L., Lee, Pooi See, Pey, Kin Leong, Wang, X. C., Lim, G. C.
• مؤلفون آخرون: School of Materials Science & Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2012
• الموضوعات: DRNTU::Engineering::Materials
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/94999; http://hdl.handle.net/10220/8009
• المؤسسة: Nanyang Technological University

The effect of multiple-pulsed laser irradiation on Ni silicide formation in Ni(Ti) /Si system was studied. A layered structure consisting of both crystalline NiSi2 and Ni-rich Ni–Si amorphous phases with a protective TiOx overlayer was formed after five-pulsed laser annealing at 0.4 J...