Effects of nitric-oxide-plasma treatment on the electrical properties of tetraethylorthosilicate-deposited silicon dioxides on strained-Si1-xGex layers

由 Senapati, B., Samanta, S.K., Maikap, S., Bera, L.K., Maiti, C.K.
出版 2014

Effects of thermal annealing on the electrical properties of tetraethylorthosilicate-based oxynitride films deposited on strained-Si1-xGex

由 Samanta, S.K., Bera, L.K., Benerjee, H.D., Maiti, C.K.
出版 2014

Gate dielectrics on strained-Si/SiGe heterolayers

由 Maiti, C.K., Samanta, S.K., Chatterjee, S., Dalapati, G.K., Bera, L.K.
出版 2014

Effect of post-oxidation annealing on the electrical properties of deposited oxide and oxynitride films on strained-Si0.82Ge0.18 layers

由 Samanta, S.K., Maikap, S., Bera, L.K., Banerjee, H.D., Maiti, C.K.
出版 2014

High quality gate dielectrics grown by rapid thermal processing using split-N 2O technique on strained-Si 0.91Ge 0.09 films

由 Bera, L.K., Choi, W.K., Tan, C.S., Samanta, S.K., Maiti, C.K.
出版 2014

Interface properties and reliability of ultrathin oxynitride films grown on strained Si1-xGex substrates

由 Samanta, S.K., Chatterjee, S., Maikap, S., Bera, L.K., Banerjee, H.D., Maiti, C.K.
出版 2014

Structural and electrical characterizations of oxynitride films on solid phase epitaxially grown silicon carbide

由 Bera, L.K., Choi, W.K., McNeill, D., Ray, S.K., Chatterjee, S., Maiti, C.K.
出版 2014

Reliability of ultrathin (

由 Samanta, S.K., Chatterjee, S., Choi, W.K., Bera, L.K., Banerjee, H.D., Maiti, C.K.
出版 2014

N2O oxidation of strained-Si/relaxed-SiGe heterostructure grown by UHVCVD

由 Tan, C.S., Choi, W.K., Bera, L.K., Pey, K.L., Antoniadis, D.A., Fitzgerald, E.A., Currie, M.T., Maiti, C.K.
出版 2014

Rapid thermal oxidation of Ge-rich Si1-xGex heterolayers

由 Bera, M.K., Chakraborty, S., Das, R., Dalapati, G.K., Chattopadhyay, S., Samanta, S.K., Yoo, W.J., Chakraborty, A.K., Butenko, Y., Šiller, L., Hunt, M.R.C., Saha, S., Maiti, C.K.
出版 2014