Dalapati, G., Kumar, A., Wong, A., Kumar, M., Chia, C., Ho, G., . . . ENGINEERING, E. &. C. (2014). Sputter-deposited ZrO2 gate dielectric on high mobility epitaxial-GaAs/Ge channel material for advanced CMOS applications.

Dalapati, G.K., A. Kumar, A.S.W Wong, M.K Kumar, C.K Chia, G.W Ho, D. Chi, and ELECTRICAL & COMPUTER ENGINEERING. Sputter-deposited ZrO2 Gate Dielectric On High Mobility Epitaxial-GaAs/Ge Channel Material for Advanced CMOS Applications. 2014.

Dalapati, G.K., et al. Sputter-deposited ZrO2 Gate Dielectric On High Mobility Epitaxial-GaAs/Ge Channel Material for Advanced CMOS Applications. 2014.