Strained n-channel transistors with silicon source and drain regions and embedded silicon/germanium as strain-transfer structure
10.1109/LED.2007.900195
محفوظ في:
المؤلفون الرئيسيون: | , , , , |
---|---|
مؤلفون آخرون: | |
التنسيق: | مقال |
منشور في: |
2014
|
الموضوعات: | |
الوصول للمادة أونلاين: | http://scholarbank.nus.edu.sg/handle/10635/83080 |
الوسوم: |
إضافة وسم
لا توجد وسوم, كن أول من يضع وسما على هذه التسجيلة!
|
id |
sg-nus-scholar.10635-83080 |
---|---|
record_format |
dspace |
spelling |
sg-nus-scholar.10635-830802024-11-09T07:32:28Z Strained n-channel transistors with silicon source and drain regions and embedded silicon/germanium as strain-transfer structure Ang, K.-W. Tung, C.-H. Balasubramanian, N. Samudra, G.S. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING Electron mobility Silicon/germanium Strain-transfer structure (STS) Strained n-channel field-effect transistor (n-FET) 10.1109/LED.2007.900195 IEEE Electron Device Letters 28 7 609-612 EDLED 2014-10-07T04:37:01Z 2014-10-07T04:37:01Z 2007-07 Article Ang, K.-W., Tung, C.-H., Balasubramanian, N., Samudra, G.S., Yeo, Y.-C. (2007-07). Strained n-channel transistors with silicon source and drain regions and embedded silicon/germanium as strain-transfer structure. IEEE Electron Device Letters 28 (7) : 609-612. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2007.900195 07413106 http://scholarbank.nus.edu.sg/handle/10635/83080 000247643900023 Scopus |
institution |
National University of Singapore |
building |
NUS Library |
continent |
Asia |
country |
Singapore Singapore |
content_provider |
NUS Library |
collection |
ScholarBank@NUS |
topic |
Electron mobility Silicon/germanium Strain-transfer structure (STS) Strained n-channel field-effect transistor (n-FET) |
spellingShingle |
Electron mobility Silicon/germanium Strain-transfer structure (STS) Strained n-channel field-effect transistor (n-FET) Ang, K.-W. Tung, C.-H. Balasubramanian, N. Samudra, G.S. Yeo, Y.-C. Strained n-channel transistors with silicon source and drain regions and embedded silicon/germanium as strain-transfer structure |
description |
10.1109/LED.2007.900195 |
author2 |
ELECTRICAL & COMPUTER ENGINEERING |
author_facet |
ELECTRICAL & COMPUTER ENGINEERING Ang, K.-W. Tung, C.-H. Balasubramanian, N. Samudra, G.S. Yeo, Y.-C. |
format |
Article |
author |
Ang, K.-W. Tung, C.-H. Balasubramanian, N. Samudra, G.S. Yeo, Y.-C. |
author_sort |
Ang, K.-W. |
title |
Strained n-channel transistors with silicon source and drain regions and embedded silicon/germanium as strain-transfer structure |
title_short |
Strained n-channel transistors with silicon source and drain regions and embedded silicon/germanium as strain-transfer structure |
title_full |
Strained n-channel transistors with silicon source and drain regions and embedded silicon/germanium as strain-transfer structure |
title_fullStr |
Strained n-channel transistors with silicon source and drain regions and embedded silicon/germanium as strain-transfer structure |
title_full_unstemmed |
Strained n-channel transistors with silicon source and drain regions and embedded silicon/germanium as strain-transfer structure |
title_sort |
strained n-channel transistors with silicon source and drain regions and embedded silicon/germanium as strain-transfer structure |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/83080 |
_version_ |
1821222281182969856 |