APA引文

Zhu, S., Singh, J., Zhu, C., Du, A., Li, M., & ENGINEERING, E. &. C. (2014). Fabrication of poly-Si TFT with silicided Schottky barrier source/drain, high-κ gate dielectric and metal gate.

Chicago Style Citation

Zhu, S., J. Singh, C. Zhu, A. Du, M.F Li, and ELECTRICAL & COMPUTER ENGINEERING. Fabrication of Poly-Si TFT With Silicided Schottky Barrier Source/drain, High-κ Gate Dielectric and Metal Gate. 2014.

MLA引文

Zhu, S., et al. Fabrication of Poly-Si TFT With Silicided Schottky Barrier Source/drain, High-κ Gate Dielectric and Metal Gate. 2014.

警告:這些引文格式不一定是100%准確.