Spreading resistance profiling of ultrashallow junction NPN BJT, with carrier redistribution effect

• Main Authors: Tan, L.C.P., Tan, L.S., Leong, M.S.
• 其他作者: ELECTRICAL ENGINEERING
• 格式: Conference or Workshop Item
• 出版: 2014
• 主題: BJT; Carrier redistribution effect; Dopant profile; Metallurgical junctions; On-bevel junctions; Spreading resistance profiling; Ultrashallow junctions
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/81767
• 機構: National University of Singapore

10.1117/12.405373