Application of excimer laser annealing in the formation of ultra-shallow p+/n junctions

• Main Authors: Chong, Y.F., Pey, K.L., Wee, A.T.S., See, A., Tung, C.-H., Gopalakrishnan, R., Lu, Y.F.
• 其他作者: INSTITUTE OF MICROELECTRONICS
• 格式: Conference or Workshop Item
• 出版: 2014
• 主題: Excimer laser annealing; Rapid thermal annealing; Ultra-low energy ion implantation; Ultra-shallow junction
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/81379

10.1117/12.405380