Effects of electric field in band alignment measurements using photoelectron spectroscopy

• Main Authors: Chiam, S.Y., Liu, Z.Q., Pan, J.S., Manippady, K.K., Wong, L.M., Chim, W.K.
• 其他作者: ELECTRICAL & COMPUTER ENGINEERING
• 格式: Conference or Workshop Item
• 出版: 2014
• 主題: band offsets; extra-atomic relaxation; field effects; UPS; work function; XPS
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/70096

10.1002/sia.3851