$In-situ X-ray diffraction analysis of the crystallisation of a-SI:H films deposited by the expanding thermal plasma technique$

In-situ X-ray diffraction analysis of the crystallisation of a-SI:H films deposited by the expanding thermal plasma technique

10.1109/PVSC.2011.6186582

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書目詳細資料
Main Authors:	Law, F., Hoex, B., Wang, J., Luther, J., Sharma, K., Creatore, M., Van De Sanden, M.C.M.
其他作者:	SOLAR ENERGY RESEARCH INST OF S'PORE
格式:	Conference or Workshop Item
出版:	2014
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/52639
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!
機構:	National University of Singapore

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