Ab initio simulations of low-k and ultra low-k dielectric interconnects

• Main Authors: Tan, V.B.C., Dai, L., Yang, S.W., Chen, X.T., Wu, P.
• 其他作者: MECHANICAL ENGINEERING
• 格式: Conference or Workshop Item
• 出版: 2014
• 主題: Ab initio molecular dynamics; Diffusion barrier; Low-k dielectrics
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/51556
• 機構: National University of Singapore

Diffusion and Defect Data Pt.B: Solid State Phenomena