APA استشهاد

Ong, S., Chor, E., Leung, Y., Lee, J., Li, W., See, A., . . . ENGINEERING, E. (2014). Steep retrograde indium channel profiling for high performance nMOSFETs device fabrication.

استشهاد بنمط شيكاغو

Ong, S.Y., E.F Chor, Y.K Leung, J. Lee, W.S Li, A. See, L. Chan, و ELECTRICAL ENGINEERING. Steep Retrograde Indium Channel Profiling for High Performance NMOSFETs Device Fabrication. 2014.

MLA استشهاد

Ong, S.Y., et al. Steep Retrograde Indium Channel Profiling for High Performance NMOSFETs Device Fabrication. 2014.

تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.