Ong, S., Chor, E., Leung, Y., Lee, J., Li, W., See, A., . . . ENGINEERING, E. (2014). Steep retrograde indium channel profiling for high performance nMOSFETs device fabrication.
استشهاد بنمط شيكاغوOng, S.Y., E.F Chor, Y.K Leung, J. Lee, W.S Li, A. See, L. Chan, و ELECTRICAL ENGINEERING. Steep Retrograde Indium Channel Profiling for High Performance NMOSFETs Device Fabrication. 2014.
MLA استشهادOng, S.Y., et al. Steep Retrograde Indium Channel Profiling for High Performance NMOSFETs Device Fabrication. 2014.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.