APA引文

Jia, Y., Lim, C., Bourdillon, A., Boothroyd, C., & SCIENCE, M. (2014). Transmission electron microscopy observation of CMOS devices of titanium self-aligned silicide technology with nitrogen (N+) implantation process.

Chicago Style Citation

Jia, Y.M., C.W Lim, A.J Bourdillon, C. Boothroyd, and MATERIALS SCIENCE. Transmission Electron Microscopy Observation of CMOS Devices of Titanium Self-aligned Silicide Technology With Nitrogen (N+) Implantation Process. 2014.

MLA引文

Jia, Y.M., et al. Transmission Electron Microscopy Observation of CMOS Devices of Titanium Self-aligned Silicide Technology With Nitrogen (N+) Implantation Process. 2014.