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Jia, Y.M., C.W Lim, A.J Bourdillon, C. Boothroyd, و MATERIALS SCIENCE. Transmission Electron Microscopy Observation of CMOS Devices of Titanium Self-aligned Silicide Technology With Nitrogen (N+) Implantation Process. 2014.

Jia, Y.M., et al. Transmission Electron Microscopy Observation of CMOS Devices of Titanium Self-aligned Silicide Technology With Nitrogen (N+) Implantation Process. 2014.