Application of carbon nanotubes (CNTS) in copper/low k interconnects design

• المؤلف الرئيسي: Loo, Shane Zhi Yuan
• مؤلفون آخرون: Sridhar Idapalapati
• التنسيق: Theses and Dissertations
• اللغة: English
• منشور في: 2010
• الموضوعات: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics; DRNTU::Engineering::Nanotechnology
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/41444

With continuing device scaling from a 90nm to a 65nm node, wiring interconnect becomes increasingly crucial due to the effects on electrical resistance and wiring capacitance. The electrical resistance and parasitic capacitance associated with these metal interconnections has become a major factor...