Thin film fabrication for optimal reflectivity coatings at 1064nm

• المؤلف الرئيسي: Xiao, Zed Zhiqiang
• مؤلفون آخرون: Tay Beng Kang
• التنسيق: Final Year Project
• اللغة: English
• منشور في: 2009
• الموضوعات: DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials
• الوصول للمادة أونلاين: http://hdl.handle.net/10356/16686
• المؤسسة: Nanyang Technological University

In collaboration with Defence Science Organization, this project aim to achieve optimal reflectivity at 1064nm using Filter Cathodic Vacuum Arc (FCVA) technique. It involved fabrication of single and multi-layer thin film coating using Silicon and Titanium target. In this project, depositions are do...