Property study of aluminium oxide thin films by thermal annealing

• المؤلفون الرئيسيون: Zhao, Zhiwei, Tay, Beng Kang
• مؤلفون آخرون: School of Electrical and Electronic Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2013
• الموضوعات: DRNTU::Engineering::Electrical and electronic engineering
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/105232; http://hdl.handle.net/10220/16801; http://dx.doi.org/10.1002/pssc.201084181
• المؤسسة: Nanyang Technological University

Aluminium oxide thin films had been prepared by off-plane filtered cathodic vacuum arc (FCVA) under the oxygen partial pressure of 5 × 10-4 Torr at room temperature. Annealing effects on the properties of the films between 200 °C and 900 °C were investigated. Experiments results showed that the surf...