การดัดแปรเครื่องพลาสมาโฟกัสเพื่อก่อกำเนิดรังสีเอกซ์ทรีมอัลตราไวโอเลต
As Extreme Ultra Violet (EUV) radiation will be widely used in future semiconductor industry and a plasma focus (PF) device has been known to be the powerful source of radiation and particles which can be easily modified to suit different applications need, therefore an interest in the modification...
Saved in:
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Theses and Dissertations |
| Language: | Thai |
| Published: |
จุฬาลงกรณ์มหาวิทยาลัย
2008
|
| Subjects: | |
| Online Access: | https://digiverse.chula.ac.th/Info/item/dc:35128 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | Chulalongkorn University |
| Language: | Thai |