Reliability analysis of thin HfO2/SiO2 gate dielectric stack

由 Samanta, P., Zhu, C., Chan, M.
出版 2014

Charge carrier generation/trapping mechanisms in HfO2/SiO2 stack

由 Samanta, P., Zhu, C., Chan, M.
出版 2014

On the electrical stress-induced oxide-trapped charges in thin Hf O2 Si O2 gate dielectric stack

由 Samanta, P., Zhu, C., Chan, M.
出版 2014

Comparison of electrical stress-induced charge carrier generation/trapping and related degradation of SiO2 and HfO2/SiO2 gate dielectric stacks

由 Samanta, P., Zhu, C., Chan, M.
出版 2014

Direct tunneling stress-induced leakage current in ultrathin HfO 2SiO2 gate dielectric stacks

由 Samanta, P., Man, T.Y., Zhang, Q., Zhu, C., Chan, M.
出版 2014

Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics

由 Samanta, P., Man, T.Y., Chan, A.C.K., Zhang, Q., Zhu, C., Chan, M.
出版 2014

Direct tunneling stress-induced leakage current in NMOS devices with ultrathin gate oxides

由 Samanta, P., Man, T.Y., Chan, A.C.K., Zhang, Q., Zhu, C., Chan, M.
出版 2014