Srinivasarao, V., Jayaganthan, R., Sekhar, V., Mohankumar, K., Tay, A., Kripesh, V., & ENGINEERING, M. (2014). Nanoindentation study of the sputtered Cu thin films for interconnect applications.
Chicago Style CitationSrinivasarao, V., R. Jayaganthan, V.N Sekhar, K. Mohankumar, A.A.O Tay, V. Kripesh, and MECHANICAL ENGINEERING. Nanoindentation Study of the Sputtered Cu Thin Films for Interconnect Applications. 2014.
MLA CitationSrinivasarao, V., et al. Nanoindentation Study of the Sputtered Cu Thin Films for Interconnect Applications. 2014.
Warning: These citations may not always be 100% accurate.