APA Citation

Srinivasarao, V., Jayaganthan, R., Sekhar, V., Mohankumar, K., Tay, A., Kripesh, V., & ENGINEERING, M. (2014). Nanoindentation study of the sputtered Cu thin films for interconnect applications.

Chicago Style Citation

Srinivasarao, V., R. Jayaganthan, V.N Sekhar, K. Mohankumar, A.A.O Tay, V. Kripesh, and MECHANICAL ENGINEERING. Nanoindentation Study of the Sputtered Cu Thin Films for Interconnect Applications. 2014.

MLA Citation

Srinivasarao, V., et al. Nanoindentation Study of the Sputtered Cu Thin Films for Interconnect Applications. 2014.

Warning: These citations may not always be 100% accurate.