A dual BARC method for lithography and etch for Dual damascene with low K

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Saved in:
書目詳細資料
Main Authors: Mukherjee-Roy, M., Bliznetsov, V., Samudra, G.
其他作者: ELECTRICAL & COMPUTER ENGINEERING
格式: Article
出版: 2014
主題:
在線閱讀:http://scholarbank.nus.edu.sg/handle/10635/54095
標簽: 添加標簽
沒有標簽, 成為第一個標記此記錄!
機構: National University of Singapore