A mechanism of field-oxide-ungrowth phenomenon in recessed isolation process and practical solution

بواسطة Jang, S.-A., Kim, Y.-B., Cho, B.-J., Kim, J.-C.
منشور في 2014

Isolation process induced wafer warpage

بواسطة Jang, S.-A., Yeo, I.-S., Kim, Y.-B., Cho, B.-J., Lee, S.-K.
منشور في 2014

Hydrogenation properties of Ni-Nb-Zr-Ta amorphous ribbons

بواسطة Jayalakshmi, S., Choi, Y.G., Kim, Y.C., Kim, Y.B., Fleury, E.
منشور في 2014

Hot-carrier degradation mechanism in narrow- and wide-channel n-MOSFET's with recessed LOCOS isolation structure

بواسطة Yue, J.M.P., Chim, W.K., Cho, B.J., Chan, D.S.H., Qin, W.H., Kim, Y.-B., Jang, S.-A., Yeo, I.-S.
منشور في 2014

Channel-width effect on hot-carrier degradation in NMOSFETs with recessed-LOCOS isolation structures

بواسطة Yue, J.M.P., Chim, W.K., Cho, B.J., Chan, D.S.H., Qin, W.H., Kim, Y.B., Jang, S.A., Yeo, I.S.
منشور في 2014

Suppression of mixed-phase areas in highly elongated BiFeO 3 thin films on NdAlO 3 substrates

بواسطة Woo, C.-S., Lee, J.H., Chu, K., Jang, B.-K., Kim, Y.-B., Koo, T.Y., Yang, P., Qi, Y., Chen, Z., Chen, L., Choi, H.C., Shim, J.H., Yang, C.-H.
منشور في 2014